Latest from Semiconductor Engineering
Researchers at imec published “Beyond HBM-on-GPU: Thermal Design Envelope for 3D Volumetric DRAM-on-GPU Integration.” Summary: Researchers evaluated a 3D memory architecture that rotates DRAM dies vertically above a GPU and places cooling cavities between them as an alternative to conventional 2.5D HBM and…
Expert panel sees a compelling productivity case, but the entire photomask ecosystem must be ready together. The post Large-Format Masks Move From Aspiration To Industry Roadmap appeared first on Semiconductor Engineering.
New test requirements include fiber alignment, coupling efficiency, polarization management, and optical instrumentation. The post Testing Silicon Photonics At Scale appeared first on Semiconductor Engineering.
Pinpointing failures, ensuring known-good optical engines, and controlling test costs become increasingly critical as photonics moves into advanced packages. The post Bringing Down Test Costs For Co-Packaged Optics appeared first on Semiconductor Engineering.
Researchers at the Technical University of Munich and Indian Institute of Technology Kanpur published “Self-Heating and Parasitic Effects in Multi-Tier CFET Design.” Abstract Excerpt: “We study the impact of self-heating effects (SHEs) and middle of line (MOL) and back-end of line (BEOL) induced parasitics on…
Researchers at Chinese Academy of Sciences, Jilin University, State Key Laboratory of Advanced Manufacturing for Optical Systems, and University of Chinese Academy of Sciences published a technical paper titled “Evaluating an alternative Pt-W alloy as a low-n EUV mask absorber: Film properties and imaging…
Researchers at KU Leuven, Kunsan National University, Vrije Universiteit Brussel, imec, et al. published “Irradiation-Source-Dependent Tone Conversion in Dry-Deposited Halogenated Amorphous Zeolitic Imidazolate Framework Resists for Electron-Beam and Extreme Ultraviolet Lithography.” Abstract Excerpt: “Dry-deposited…
Researchers from Institute of Science Tokyo, Yokohama National University, AIST, and Photonics Electronics Technology Research Association (PETRA) published a technical paper titled “Reduced-DSP 200G/λ Low-Voltage Slow-Light Silicon Modulator Enabled by Built-In EO Equalizer.” Abstract Excerpt: “Multi-Tb/s optical…
Researchers at Arizona State University and University of Maryland published “SEAL: Multitenant Security-Aware Layer Mapping for Heterogeneous 3-D CiM Accelerators.” Abstract: “Heterogeneous 3-D compute-in-memory architectures can combine different memory technologies across stacked tiers to accelerate deep neural…
Researchers at Technical University of Munich published “NN-Based Transistor Modeling for Ultra-Fast SPICE Simulation and Standard Cell Library Characterization.” Abstract: “Neural network (NN)-based transistor models have proven to be a promising solution to accelerate device modeling. Although these models…
CHIPS Act $389M to power chips, vertical GaN, materials; Micron's memory roadmap; Nvidia expands supply chain capacity; Tenstorrent raises $1.5B; China NAND fabs; 800V power for AI data centers; Intel advances Arizona fab; China orders +$35B in Nvidia GPUs. The post Chip Industry Week In Review appeared first on…
Why better models, richer metrology, explainable AI, and cross-industry collaboration must come together to extend semiconductor scaling. The post Beyond The EPE Budget: Building The Next Generation Of Computational Lithography appeared first on Semiconductor Engineering.
Two devices operating at exactly the same voltage, frequency, and temperature can behave differently depending on what they are being asked to do. The post PVTW: Extending Silicon Characterization From PVT To Real-World Workload appeared first on Semiconductor Engineering.
SEMICON West 2026: Advanced packaging, photonics, test, and AI are increasingly intertwined; very different conversations ahead. The post Chip Scaling Moves Beyond The Transistor appeared first on Semiconductor Engineering.
A process sequence for SRAM and logic that delivers higher performance through larger effective channel width and improved electrostatics at smaller nodes. The post How Self-Aligned CFET Technology Could Extend CMOS Scaling Beyond 10 Å appeared first on Semiconductor Engineering.